Special Issue/Recent Trend and Future of Photoresists for Microlithography. Trend of High Resolution for Positive Photoresists.
نویسندگان
چکیده
منابع مشابه
Positive Photoresists - Exposure
There are a large number of materials, both organic and inorganic, which are sensitive to light (see, for example, Ref. 1). However, over the years one specific class of photosensitive materials has been dominate in the application of integrated circuit manufacturing -the diazonaphthoquinone/novolak system found in conventional g-line and i-line positive photoresists. Rather than present a comp...
متن کاملExposure of Photoresists
Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm) (fig. right-hand), with an iline intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photo...
متن کاملSpin Coating of Photoresists
During spincoating, the centrifugal force of the substrate spinning with several 1.000 rounds per minute (rpm) distributes few ml of resist over the substrate. Advantages: The high resist film thickness homogeneity as well as the short coating times make spincoating the most-applied coating technique at least in microelectronics. The fact that the coated resist already lost a significant amount...
متن کاملExposure of Photoresists
Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm), with an i-line intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photoresists is matche...
متن کاملHigh-performance liquid chromatographic method of photoactive compounds based on diazonaphthoquinone for positive photoresists.
An analytical method for the compositional and quantitative analysis of photoactive compounds (PACs) in positive photoresist (Posi PR) has been developed by high-performance liquid chromatography (HPLC). Under optimum HPLC conditions, various types of PACs consisting of a mixture of isomers were satisfactorily separated with no interference. This method was applied to the quantitative analysis ...
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ژورنال
عنوان ژورنال: Journal of the Surface Finishing Society of Japan
سال: 1993
ISSN: 0915-1869,1884-3409
DOI: 10.4139/sfj.44.473